Technology for thin film heads and patterned media

MEOL Mid-End-Of-Line Wireless Photonics Solid State Lighting MEMS/NEMS Nanotechnology Renewable Energies Data Storage Photomask Research and Development

Data Storage

The growth in information has led to increases in data storage capacity in everything from hard disk drives to portable devices, smartphones and even appliances. Now, the "Internet of Things" (IOT) and cloud computing are driving even greater demand for data storage.

Plasma-Therm has participated in the data storage market for more than 15 years, providing solutions that have evolved along with the industry. As a result, Plasma-Therm has the largest installed base of etch and PECVD process equipment in the industry. Recently, Plasma-Therm has begun taking advantage of its experience in the photomask etching market to demonstrate high CD uniformity control on 200mm wafers.

Reproducibility in a production environment is ensured with Plasma-Therm’s actively controlled ICP heated process module and integrated endpoint system, EndpointWorks, which works with laser interferometry, optical emission spectroscopy, and other inputs.

Typical applications

  • SiC with high etch rate and extended maintenance intervals
  • Pole tip definition with high aspect ratio profile control
  • Alumina etch with high etch rate and profile control
  • BARC etch with high CD control
  • Oxide deposition at low temperature for high-density, high-quality films and trench fill
  • PECVD—low CoO, hard mask applications
  • Nano-imprint templates for patterned media
  • Metal etching (Cr, Ta, Ti, W, TiW)



Detail images


For more information, contact us at or at +1.727.577.4999


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