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Extended process window: PULSE DURATION customization

Extended process window: PULSE POSITION customization

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F.A.S.T.® (Fast Atomic Sequential Technology)
At the crossroads of CVD and ALD deposition techniques, F.A.S.T.® proposes: unique film properties, best in class solution for Thick and Conformal layers, and ALD film performances at CVD speed.
Unique Process Control
- Temporal control
- Better film properties
- Separate species inlets
- No parasitic reactions
- High reaction rate
- Lower precursor consumption and higher deposition rate
- Precise volume introduction
- Repeatability
Features
- Plasma enhanced deposition
- Unique in-situ cleaning capability
- Single wafer process module
- Low cost of ownership
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