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Research & Development
To stay at the forefront of technology, universities, institutes, and manufacturers
conduct R&D on a continuous basis, seeking solutions for the many global challenges
of today. From lighting to data-storage to clean energy sources, the quest for higher-efficiency products that provide higher performance at lower cost and in smaller
form-factors are the main drivers of R&D.
Plasma-Therm from its inception has been a research partner as well as a supplier
to many of the leading universities and R&D institutes worldwide. In addition, Plasma-Therm
performs R&D internally to continuously improve system performance
and quality. With manual-load, single-substrate, and cassette-to-cassette
configurations, Plasma-Therm systems provide a range of plasma etch and deposition solutions for R&D.
Advanced process control with Plasma-Therm's EndpointWorks™ gives researchers
valuable insight into their etch and PECVD processes, and this, along with reproducibility
and low maintenance, makes Plasma-Therm a premier supplier to R&D organizations.
Typical Applications
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Etch
- Si
- SiN
- SiC
- PSS (patterned sapphire substrate)
- GaN
- GaAs
- AlGaInP (and related materials)
- GaP
- Quartz
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Deposition
- SiNx PECVD stress controlled at high rates
with excellent conformality
- SiO2—High breakdown voltage, low
stress, low temperature
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Wafer Singulation
Products
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Detail Images
For more information, contact us at
information@plasmatherm.com or at +1.727.577.4999
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