MASK ETCHER® SYSTEMS
PLASMA-THERM’S® MASK ETCHER SYSTEMS SET DRY-ETCH PERFORMANCE AND FLEXIBILITY STANDARDS FOR PHOTOMASK PRODUCTION
Plasma-Therm pioneered dry etching for the highly specialized photomask market in 1998. Since then, our Mask Etcher solutions have been a key enabler of Moore’s Law. The Mask Etcher platform tracked with scaling nodes, and now, with our fifth-generation technology (Gen V), we are at the leading edge. Whether you’re using Cr, phase shift, or EUV mask materials, our Mask Etcher system is ready. Innovative technologies ensure excellent uniformity and particle control while also maintaining high system production uptime and yields.
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